News Desk
KIRYAT GAT, Israel:At least three people were seriously injured in an explosion at an Intel semiconductor manufacturing facility in the southern Israeli city of Kiryat Gat on Wednesday, Israeli media reported.
The Jerusalem Post, citing Israel’s Magen David Adom emergency medical service, reported that three people sustained serious injuries in the blast.
Israeli police said the explosion was suspected to have been caused by a gas cylinder detonating, according to the newspaper.
The incident also raised concerns about a possible hazardous chemical leak. Israel’s Fire and Rescue Authority reported that chemicals may have escaped following the explosion, prompting emergency teams to identify the source of the substances and tackle a fire at the site.
Israeli news outlet Ynet reported that the incident involved nitrogen trifluoride, a gas used in semiconductor manufacturing. Specialist hazardous materials teams were deployed to monitor the area and assess potential risks.
The Fire and Rescue Authority subsequently brought the source of the fire under control, Ynet reported.
Eight firefighting and rescue teams, alongside specialist hazardous materials units from neighbouring stations, were initially dispatched to the scene.
The precise cause of the explosion had not been established, and the extent of any chemical release remained unclear in the initial reports.
Intel’s Kiryat Gat facility manufactures semiconductor chips and is part of the company’s manufacturing operations in Israel, according to The Jerusalem Post.
